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  • Product Overview

    DoE/Diffuser detection equipment

    AIT DOE/Diffusei # testing equipment is mainly used to detect the diffraction performance parameters of wafer chip, and the regular diffraction image after laser diffraction through the chip

    product details

    Application Area

    Measurement of diffraction performance of chips in semiconductor field


    Features and Advantages

    High precision visual positioning to ensure the accuracy of chip inspection position

    Adjustable imaging systems - Compatible with different types of chip detection

    Self developed software algorithm with complete functions to meet different customer needs


    Technical Parameters

    Repetitive positioning accuracy 3um

    UPH:2500-3500

    Compatible with two different types of products: DOE and Diffuseri

    Repeated detection data fluctuates within 5%

    Maximum FOV of products supported for detection: 110

    The high-precision positioning vision system calibrates the angle and position of the wafer to ensure that each chip on the wafr can be exactly above the light source during the detection process;

    The height of light source in Z direction can be adjusted by motor to meet the distance requirements of different lasers or modules.



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